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Two complementary types NPN and PNP of bipolar junction transistors (BJTs) were exposed to high dose of neutrons and gamma rays. The change in the base and collector currents, minority carriers lifetime, and current gain factor β with respect to the dose were analyzed. The contributions of the base current according to the defect types were also reported. It was declared that the radiation effect of neutrons was almost similar between the two transistor types, this effect at high dose may decrease the value of β to less than one. The Messenger–Spratt equation was used to describe the experimental results in this case. However, the experimental data demonstrated that the effect of gamma rays was generally higher on NPN than PNP transistors. This is mainly attributed to the difference in the behavior of the trapped positive charges in the SiO2 layers. Meanwhile, this difference tends to be small for high gamma dose.
Basic mechanisms of total radiation effects have been investigated continually. Considerable efforts have been devoted to acquire more knowledge about the hardness of semiconductor devices. Due to high performance characteristics in switching and amplification, bipolar junction transistors (BJTs) are used in various electronic systems. However, the exposure of BJTs to nuclear radiation can affect their characteristics. Meanwhile, there are still some advantages even when used in the circuits under radiation.[1]
The main degradation of irradiated semiconductor devices is produced by the effect of ionization and atomic displacement. According to their origin, ionization and atomic displacement are conventionally referred to as the total ionization dose (TID) and the non ionization energy losses (NIEL), respectively. The radiation effect is related to the energy and type of radiation, and depends on the structure of the transistor. The two main types of BJT (NPN and PNP) exhibit qualitatively the same radiation effects. However, for vertical BJTs design, it was noticed that NPN is more degraded by irradiation than PNP. Several mechanisms describing the damage effects in both types have been reported. Whatever the source of damage in BJTs, its main final effect is the decrease of the β factor, this effect was widely approached in several works for various types and structures of BJTs.[2–4]
The aim of this study is to obtain more knowledge about the effect of neutrons and gamma rays on complementary small signal BJTs. This was accomplished by analyzing the changes in the collector current IC, base current IB and β, on vertical NPN and PNP transistors, and comparing their behaviors. Moreover, the comparison between the effect of surface and bulk damages according to the transistor and radiation types would be reported. The important role of the recombination of the minority carrier charges occurring in the transistor bases after irradiation will also be addressed. Another aim of this work is using the Messenger–Spratt equation to illustrate the change in the transistor parameters for a large range of radiation dose. This issue was also useful for analyzing other types of radiation.[4]
The flow of the minority carrier provides the basic mechanism of the BJT operation. TID and NIEL are the matter of defects in the BJT structure. They increase the recombination rate in the base region of the transistor and then decrease the minority carrier lifetime τ. This decrease is the fundamental mechanism which describes the β degradation, and then the transistor operation. In fact, β is physically determined by the fraction of the majority carriers injected from the emitter that passes through the base as minority carriers and collected finally by the collector; this fraction equals then to IC/IB. The lifetime τ represents the surviving average time of these minority carriers before the recombination with the majority carriers of the base. Therefore, the practical consequences of this effect on the transistor function lead in general to varying the values of IC and IB currents.[5–8] As the role of IB is essential in the degradation process, it is useful to present some details about its contributions. For a conventional BJT type, the total base current IB is composed of three components IB1, IB2, and IB3. The component IB1 represents the main component resulted by the injection of the minority carriers from the base to the emitter, and it is independent of τ. The IB2 is due to the recombination in the depletion zone (DZ) of the emitter–base junction. The last component IB3 also represents a recombination current but inside the neutral base region; it is inversely proportional to τ. Thus, IB2 and IB3 are produced by recombination occurring between diffused majority carriers traversing the base and the base minority carries.[7] Figure
In electronic devices, the ionization produces electron–hole pairs within the semiconductors such as silicon (Si) and the dielectric layers such as silicon dioxide (SiO2). The free electrons are much more mobile than holes and those do not immediately recombine but they diffuse away by means of the electric field after a short time. While, the holes will make their way towards the SiO2 and Si/SiO2 interface over a longer time. Some of them will eventually recombine in the route and the rest will be captured by intrinsic defects in the SiO2 and Si/SiO2 interface regions. This capture creates two types of trapped charge. The first is the positive oxide trapped charges (POTCs) in the SiO2 layer, and the second is the interface trapped charges (ITCs) at the Si/SiO2 interface as shown in Fig.
Since POTCs are positive charges, their influence varies according to the doping of the adjacent Si layer, and then to the transistor type.
For the Si(P)/SiO2 interface, POTCs push the positive holes of the Si(P) layer toward the bulk away from the interface. As a result, a DZ below the POTCs layer will be expanded inside this P region. On the contrary, in the Si(N)/SiO2 interface, POTCs attract the negative electrons to the interface forming an accumulation zone (AZ) below it.
The created DZ in the case of the Si(P)/SiO2 interface incites to the creation of a new contribution of the base current labeled IB2surface, in addition to the main contribution denoted IB2Bulk in the main part of DZ. The contribution IB2surface is independent of τ, while IB2Bulk is inversely proportional to τ.
As to the charges ITCs, they have an amphoteric nature, and behave like acceptors, donors or neutral charges, which depends on their position in the Si energy band gap. This is related to the position of Fermi level at the Si/SiO2 interface, and depends mainly on the Si type. In all cases, ITCs act as traps of minority carriers at the surface of any formed DZ below this interface. Therefore, the effect of ITCs is qualitatively similar for the Si/SiO2 interface whatever the type of Si.
The effects of POTCs and ITCs altogether at the transistor surface can be resumed as follows: the depletion and the accumulation (resulted from POTCs) enhances and reduces the electron–hole recombination rate, respectively. Both effects are accomplished throughout the ITCs, and lead to increasing and reducing the contribution of IB2surface, respectively.[7,13]
We now present the different TID behaviors on the two vertical BJT type as follows.
(I) For the NPN device: in the base (P)/SiO2 interface, the DZ of the emitter–base junction spreads into the P-base region, which increases the DZ on the long side of the SiO2 surface and then increases IB2surface. The other effect is represented by the increase of the recombination rate inside the intrinsic base between the repelled holes from the base surface and the diffused electrons from the emitter, which increases the component IB3.[13]
(II) For the PNP device, the POTCs create a large AZ near the base (N)/SiO2 interface and they expand a small DZ into the emitter (P)/SiO2 interface. Therefore, there are a few increases in the IB2surface. However, at the same time, there are more electrons coming from the surface and injected into the emitter, which leads to some excess in the IB1.[13] These two mechanisms have a little effect on the base current compared with NPN structure.
As a result from the above analysis, the PNP structure is more radiation hardened than NPN for the TID effect.
In displacement damage, interstitials (displaced Si atoms) and vacancies are created in the form of point and cluster defects in the bulk of the transistor. These defects introduce deep level centers to serve as recombination sites and carrier traps within the lattice, which reduce the time τ. Since IB2Bulk and IB3 are inversely proportional to τ; therefore, the NIEL damage is similar to the TID which increases the current base components and then increases the total current IB leading to the decrease of the β factor.
The minority carriers in the base are electrons in NPN and holes in PNP structures. The value of τ for electrons and holes are almost equal in BJT structure, then we expect a similar effect on both structures.
The first original study characterizes the NIEL damage, which was based on the variation of the 1/τ before and after irradiation by electrons, this variation for a wide range of electrons fluence ϕ is given by[14]
Furthermore, the term 1/τ depends on the defect concentration Nd in the bulk as[15]
Introducing Eq. (
A similar formula for the change in reciprocal current gain Δ(1/β) was also established later. It is then better now to analyze the different contributions of 1/β. In fact, for radiation damage purposes, the total inverse current gain is composed from three terms and given by[16,17]
Therefore, by considering this contribution of the current gain, the combination of Eqs. (
For a mixed radiation damage (surface and bulk), the total Δ(1/β) can also be composed from two contributions given by the following equation:[19]
Before presenting the results, the following point should to clarified: the dominant mechanism that resulted from the neutrons reaction is the displacement damage, which produces a lot of damage in the form of cluster defects of atomic displacement. A small ionization can also occur which depends on the neutrons energy. While, gamma rays produce mainly the ionization, but it can also create very few damages resulted from point defects through energetic Compton electrons of high gamma energy.
The devices under test (DUTs) are complementary BJTs: NPN (2N2222 A) and PNP (2N2907 A). They are discrete commercial transistors having a vertical design. The pre-rad value of β labeled β0, is specified in each DUT and varies from one to another even for the same product. The β0 of the used transistors varied from 130 to 180. For a specific test, five DUTs having as much as possible equal β0 were submitted to the accumulated radiation dose.
DUTs were irradiated by Co-60 gamma source having an average radiation energy of 1.25 MeV. The gamma dose was measured by a chemical dosimeter. The neutron irradiation was achieved by a miniature neutron source reactor (MNSR). DUTs were exposed to a wide spectrum of neutrons inside MNSR in addition to associated fission gamma rays. As the irradiation dose inside the reactor is proportional to the fluence and to the period of irradiation, its effect was studied in this work as a function of the irradiation time at a fixed value of the fluence.
The tests were performed using two experimental set-ups. The first set-up was a curve tracer device, which plotted many curves of the current IC versus the collector–emitter voltage VCE known as the IC–VCE characteristics. Each curve corresponds to a fixed value of the current IB and then to β. The second set-up was a typical common emitter circuit built around the DUT. This circuit was connected to a signal generator, a digital oscilloscope, a DC power supply, and a current meter.
The obtained result in previous work revealed that the most damage effecting on the semiconductor after irradiation inside the MNSR comes from the neutrons compared with the fission gamma.[6] This issue is considered during presenting the results of this work through replacing the irradiation inside the reactor by neutron irradiation term. On the other hand, error bars are shown on the curves of the experimental results, and do not appear on the deduced and calculated curves. The bar represents the standard deviation error of five successive tests.
These tests were achieved at a constant value of IB equal to 50 μA. Figure
The β is to be considered as the most important parameter of the BJT to illustrate the radiation influence on such a device. The value of β is also obtained by the curve tracer. The variation of β is the function of the dose can then be presented by the curve β(dose). Figure
(I) The non-linear decreasing of the curves β(dose) was observed for both radiation effects. The factor β decreases rapidly at the beginning and slowly for higher doses until the saturation.
(II) The neutrons effect is the same between NPN and PNP types. Therefore, the NIEL damage producing the bulk defects is the same.
In general, the effect of gamma rays is higher on NPN than on PNP, i.e., β(dose)NPN > β(dose)PNP. However, the experimental results show that the difference Δβ(dose) = β(dose)NPN − β(dose)PNP for gamma rays is not constant, but varies according to the dose. It is maximum in the range between 0.1 and 10 kGy, and decreases with the increased dose. For doses more than 500 kGy, this difference tends to be small, which is due to the high rate decreasing of the curve β(dose)PNP. This behavior may be explained by the fact that the high dose produces a lot of POTCs, which increase significantly the electrons of the N-base repelled from the surface in the PNP structure. Therefore, more electrons are injected into the emitter causing significant increase in the component IB1. Another reason may be moving the recombination into the bulk for the high doses, where the radiation effect behaves similarly between the two types.
The measurement of the variation of IC and IB in real circuit conditions was accomplished by means of a typical common emitter circuit with bias voltage VCC = 20 V. Opposite change in the values of IB and IC currents after irradiation has been reported; this change is represented by increasing and decreasing of these currents, respectively. The behaviors of IB and IC are the origin of the β decreasing shown in Fig.
(I) Irradiation by neutrons: Similar change in IB and IC was obtained for NPN and PNP. Figure
(II) Irradiation by gamma source: The currents IC and IB are also decreased and increased with the dose, respectively. However, the variations in IC and IB for NPN and PNP are different as it is shown in Fig.
A quantitative analysis of the variations of IC and IB was conducted to identify the reason of β decreasing in both transistor structures. The relative change of current ΔI% = ΔI/I0, as well as the corresponding values of β, is presented in Table
The Messenger–Spratt equation describes only the βB degradation; thereby, it is widely used to predict the type of damage. In the beginning, this equation was related to the particle fluence. Then became used later for any parameter proportional to the fluence such as the dose.[22] In this context, equation (
Figure
On the contrary, the curve of Δ(1/β) versus gamma source dose in Fig.
The change of the minority carrier lifetime τ can also be obtained from the experimental data of β using Eq. (
The variation of the consumption current ICC in the common emitter circuit using NPN and PNP was investigated. Figure
Large decreasing of the current gain β for irradiated complementary BJTs by high dose of gamma rays and neutrons has been observed. This decreasing is caused by a significant increase in IB and a small decrease in IC. The effects of charges resulting from the irradiation in the oxide, at the interface, and in the bulk of the transistor structure are presented with their impact on the current base contributions.
The effect of neutrons is almost similar for both transistor types NPN and PNP, while the effect of gamma rays is in general higher on NPN than PNP. The difference between the base and the emitter of the transistors regarding the sensitivity to the gamma rays is attributed to the expansion of the positive oxide trapped charges toward the emitter in PNP and into the base for NPN. However, this difference for the gamma rays effect on NPN and PNP types varies precisely according to the dose, it is maximum for doses less than 10 kGy. Whereas for doses more than 500 kGy, the effect on both transistor types tends to be similar and saturation can be seen. The reasons for this saturation are related to the phenomena occurring at high gamma source doses.
The application of the Messenger–Spratt equation confirms the similarly of neutrons effect on both transistor types and shows the domination of the displacement damage. For high irradiation time at about 800 s, β becomes equal to 1 and then IC = IB. Further increase in the irradiation time leads to the decrease of β to a value lower than 1 and then IC < IB. The transistor in this situation would work out of its normal function.
In the case of gamma rays, the plotted curves of the Messenger–Spratt equation show a non-linear form for doses less than 400 kGy resulting from the saturation behavior, which leads then to the domination of the ionization. While for the higher dose, a linear behavior is attributed to the displacement damage due to the secondary Compton electrons effect.
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